Magnetic sputtering is a technology that uses a magnetic control arc to generate plasma and sputter the atom or molecular sputter on the target to the base surface for coating. The high -purity 钆 (GD) refers to a metal material containing a high -purity element.

In the process of magnetic control sputtering high purity, we first need to prepare the target, and the high -purity 钆 material is prepared into a proper shape and size target. Then, by establishing a certain vacuum in the vacuum room, the magnetic field is used to use DC or radio frequency source to generate plasma. The atom or molecule of the target surface accelerates and splash into the base surface under the action of the magnetic field to form a high -purity coating.

The main advantage of magnetic control sputtering high purity is that it can obtain a diaphragm with good denseness, strong adhesion, uniform film formation, and high purity. Because Gao Chunxuan has good magnetic properties and thermal stability, it is widely used in magnetic sputtering coating technology. High purifier can be used in magnetic storage materials, sensors, optical film and other fields.

It should be noted that during the process of magnetic control sputtering high -purity, the sputtering process parameters should be controlled, such as sputtering power, gas flow, base material selection, etc. Essence