Advanced Court of Science and Technology Magnetic Splane High Pure HF is a commonly used surface treatment technology that can be used to prepare a high -purity thin film. Magnetic sputtering is a kind of physical gas deposition technology. It translates into ion or atomic state by using high -energy ions to bombard the surface of the target on the surface of the vacuum environment, and then sedes up to the surface of the substrate to form a film.

In the process of magnetic control sputtering, we must first choose a high -purity 铪 HF target.对于 HF's high purity is essential to obtain a pure 铪 HF film. Under normal circumstances, the purity requirements are above 99.999%or even higher. Select the appropriate target material to ensure the consistency of the chemical composition and physical properties of sputtering film.

Next, the target is placed in the sputtering source position in the vacuum chamber and adjusts the vacuum state of the vacuum to avoid the reaction between the gas molecule and the sputtering film. Then, a high -energy ion beam is applied on the surface of the target, and ions form ion cloud after entering the atmosphere. In order to increase the rate of crushing the surface of the target, the magnetic field is usually applied to make the ionic cloud move on the target and increase the probability of collision between ions and targets.

When the ion bundle hit the surface of the target, the target will release a high -purity 铪 HF atom or ion. They cross the substrate surface through the vacuum and sed it to form a thin film. The nature of the sedimentary film can be adjusted by controlling parameters such as sputtering power, sputtering time, and substrate temperature.

The main advantage of magnetic control sputtering high pure HF is that the prepared film has high purity, denseness and uniformness, and has good adhesion and high corrosion resistance. Therefore, it has been widely used in the fields of microelectronics, optoelectronics, and material science.