High -resistant film is a thin film material with high -resistance performance, which is mainly used for electrical isolation and insulation applications in the field of electronic devices and industrial fields. This membrane is usually made of special polymer materials or metal oxides, and has excellent heat resistance, chemical corrosion resistance and electrical insulation.

The main function of high -resistance diaphragm is to isolate the current between the battery or different circuits in the electronic device to prevent the mutual interference or short -circuit phenomenon of the current. This is very important for improving the performance, stability and reliability of electronic devices.

The electrical insulation performance of the high -resistance membrane depends on the characteristics and structural design of its materials. At present, the common high -resistant diaphragm materials on the market mainly include polytimononythery (PTFE), polyether ether (PEEK), polytimide (PI), etc. These materials have high insulation resistance and damage voltage, which can effectively block the flow of current.

In addition to electrical insulation performance, high -resistance membranes should also have lower gas permeability and moisture absorption performance to ensure the long -term stability and reliability of the device. In addition, high -resistance membranes can also be designed for layer -in structure according to the needs of specific applications to improve resistance and mechanical strength of the membrane.

In short, high -resistance membrane plays an important role in electronic devices and industrial applications. By selecting suitable materials, optimizing structural design and preparation processes, the performance and reliability of the device can be effectively improved.